ITRS 32nm

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POSTER: computer news   ||   ITRS 32NM	DATE:2007-03-02
On the new development of program by promising technologists, intended for application in production of semiconductor microcircuits reported corporation nikon. Together with Nikon in the work of signs the participation in European center of studies in the region of microelectronics cEA-Leti, treated by the French atomic department (Electronics and Information technology laboratory of french atomic energy commission), which focuses its efforts during the development of optical lithograph in connection with to technical processes with the use of standards 45 nm and less. Purpose of project is a study of the potential technology of dual exhibition in the production according to the standards 32 nm. According to available data, in the program will be begun to operate the lithographic scanner production nikon, installed in the research center cEA-Leti nanotec 300. The mastery of technology dual exhibition was included in plan ITRS (International technology roadmap for semiconductors : the collection of documents, prepared by branch experts) in 2006 as the possible solution of problem to passage to the standards 32 nm. The application rigid ultraviolet recovery (EUV) is also enumerated in the list of potential versions, but the rates of development of this technology can prevent its introduction in the present stage and put off this step for the next years.	ITRS 32NM

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